发明名称 |
Method for manufacturing mask, method for manufacturing wiring pattern, and method for manufacturing plasma display |
摘要 |
A method for manufacturing a mask includes performing a lyophobic treatment on at least one surface of a translucent substrate; disposing a light-shielding material on the surface subjected to the lyophobic treatment of the translucent substrate in a desired shape by using a droplet discharge method; and firing the light-shielding material so as to form a light-shielding pattern on the translucent substrate.
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申请公布号 |
US7399560(B2) |
申请公布日期 |
2008.07.15 |
申请号 |
US20070749365 |
申请日期 |
2007.05.16 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU;KIGUCHI HIROSHI |
分类号 |
G03F1/00;H01J9/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H05B33/10 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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