发明名称 Method for manufacturing mask, method for manufacturing wiring pattern, and method for manufacturing plasma display
摘要 A method for manufacturing a mask includes performing a lyophobic treatment on at least one surface of a translucent substrate; disposing a light-shielding material on the surface subjected to the lyophobic treatment of the translucent substrate in a desired shape by using a droplet discharge method; and firing the light-shielding material so as to form a light-shielding pattern on the translucent substrate.
申请公布号 US7399560(B2) 申请公布日期 2008.07.15
申请号 US20070749365 申请日期 2007.05.16
申请人 SEIKO EPSON CORPORATION 发明人 HIRAI TOSHIMITSU;KIGUCHI HIROSHI
分类号 G03F1/00;H01J9/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H05B33/10 主分类号 G03F1/00
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