发明名称 LIGHTING OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD
摘要 <p>A lighting optical system which illuminates a surface to be illuminated with light in a desired polarizing state by regulating a polarization distribution on an illumination pupil surface or a surface to be illuminated. A lighting optical system which illuminates surfaces to be illuminated (M; W) based on light from a light source (1). A polarization distribution regulating member (14) for regulating a light polarization distribution on an illumination pupil surface is provided. The polarization distribution regulating member is disposed so as to be rotatable around the optical axis (AX) of a lighting optical system, and has an optical rotation member (9) for imparting to an incident light an optical rotation varying according to an incident position. The optical rotation member is formed of an optically rotating optical material, and has its optical-axis-direction thickness changed along a direction perpendicular to the optical axis.</p>
申请公布号 KR20080066041(A) 申请公布日期 2008.07.15
申请号 KR20087011800 申请日期 2008.05.16
申请人 NIKON CORPORATION 发明人 TANAKA HIROHISA
分类号 H01L21/027;G02B19/00;G03F7/20 主分类号 H01L21/027
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