APPARATUS FOR MANUFACTURING SEMICONDUCTOR AND METHOD FOR MANUFACTURING SEMICONDUCTOR USING THE SAME

摘要

An apparatus for manufacturing a semiconductor and a method for manufacturing a semiconductor using the same are provided to prevent sublimability gases from being solidified again by heating a heating line built in a cover and exhaust lines of a reaction chamber. An apparatus for manufacturing a semiconductor comprises a track apparatus(100) and a thin film forming device or a bake oven device. An reaction chamber such as the thin film forming device and the bake oven device comprises a wafer pad(120), an upper part cover(140) and an exhaust pipe(150). A first heating line and a second heating line(145,155) are embedded in the upper part cover and the exhaust pipe respectively. A wafer(130) is loaded into the reaction chamber.