| 摘要 |
PROBLEM TO BE SOLVED: To provide a microplasma processing method for material deposition etc. using a capillary or a nozzle with an inner diameter of a few millimeters as a high-frequency microplasma generator, and an apparatus for performing the processing. SOLUTION: In the microplasma processing method and the apparatus therefor, a high-frequency plasma is generated inside the plasma-generating capillary or nozzle by applying a high-frequency voltage, and a substrate to be processed is irradiated with the generated plasma to perform processing of the substrate. The plasma is intermittently generated by modulating the high-frequency voltage. COPYRIGHT: (C)2008,JPO&INPIT
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