| 摘要 |
<p>A method for manufacturing CIS(CMOS Image Sensor) of a semiconductor device is provided to improve image quality by controlling curvature of a pixel micro lens differently according to each color. While forming a micro lens, a blue photo mask is formed by irradiating optical energy to a blue pixel region so as to decrease a refraction angle. A green photo mask is formed by irradiating lower optical energy to a green pixel region than the blue pixel region. And a red photo mask is formed by irradiating the lowest optical energy to a red pixel region so as to increase the refraction angle.</p> |
