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发明名称
Method for photomask plasma etching using a protected mask
摘要
申请公布号
EP1686422(A3)
申请公布日期
2008.07.02
申请号
EP20060250437
申请日期
2006.01.26
申请人
APPLIED MATERIALS, INC.
发明人
CHANDRACHOOD, MADHAVI;KUMAR, AJAY;YAU, WAI-FAN
分类号
G03F1/00
主分类号
G03F1/00
代理机构
代理人
主权项
地址
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