SUBSTRATE PROCESSING APPARATUS

摘要

A substrate processing apparatus is provided to improve throughput of a substrate processing apparatus by rapidly taking a substrate into/from an inversion apparatus. A first grip unit grips a substrate(W) in a vertical direction to a first axis. A second grip unit grips a substrate in a vertical direction to the first axis. A support member supports the first and second grip units in a manner that the first and second grip units overlap each other in the direction of the first axis. A rotation apparatus unitedly rotates the support member together with the first and second grip units in a direction of a second axis almost vertical to the first axis.