| 摘要 |
A compact apparatus for processing a substrate is provided to easily create a vacuum in a load lock chamber through a vacuum generation unit formed in the load lock chamber. A load lock chamber(300) includes a transfer robot(320) for loading/unloading a substrate into/from a substrate process chamber. A vacuum generation unit(400) creates a vacuum in the load lock chamber. The vacuum generation unit includes an exhaust line(410) formed on a sidewall of the load lock chamber, a vacuum pump(420) connected to the exhaust line, and a pressure gauge for measuring the pressure in the load lock chamber.
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