| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of effectively removing particles accumulated in an edge area of the upper surface, a side, an edge area of the lower surface, and the central portion on the lower surface of a substrate. SOLUTION: A plasma processing apparatus includes: a chamber; an insulating member disposed in an upper portion of the chamber; a ground electrode formed at a side wall of the chamber, a ground potential being applied to the ground electrode; and a lower electrode disposed in a lower portion of the chamber, a substrate being placed on the lower electrode, wherein the lower electrode is divided into a plurality of electrodes. COPYRIGHT: (C)2008,JPO&INPIT
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