| 摘要 |
<p>An exposure apparatus is provided to adjust distribution of the exposure quantity of a substrate by including first and second shield plates and a rotation unit for rotating at least one of the first and second shield plates. First and second shield plates regulate the region of a reticle(34) to be illuminated in an irradiation direction, disposed in an optical system(32). A rotation unit rotates at least one of the first and second shield plates in a surface vertical to the optical axis of the optical system so that the distribution of widths in a direction vertical to the irradiation direction is adjusted. The widths are the widths of the region in the irradiation direction. The optical system can include first and second masking blades that are transferred in response to the irradiation.</p> |
