发明名称 |
Design Rules Checking Augmented With Pattern Matching |
摘要 |
Layout patterns are identified as problematic when they have particular parameters required to exceed standard limits. The problematic layout patterns are associated with preferred design rules in a DRC-Plus deck. Layout data is scanned to generate match locations of any problematic layout patterns. The match locations are forwarded to a DRC engine that compares layout parameters of the match locations to corresponding preferred layout rules in the DRC-Plus deck. The DRC-Plus check results are used to modify the layout to improve manufacturability of the layout. |
申请公布号 |
US2008148211(A1) |
申请公布日期 |
2008.06.19 |
申请号 |
US20060613006 |
申请日期 |
2006.12.19 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
DAI VITO;YANG JIE;RODRIGUEZ NORMA;CAPODIECI LUIGI |
分类号 |
G06F9/455 |
主分类号 |
G06F9/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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