发明名称 APPARATUS FOR HEAT-TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a device capable of measuring the temperature and temperature distribution of a substrate that is being heat-treated. SOLUTION: A thermography 28 is provided, where thermography divides a heating plate 10 into a plurality of compartments in a plan view, arranges a separately controllable division heater for each compartment, and measures the temperature and temperature distribution of the substrate W supported on the heat plate for heat treatment. Based on the temperature and temperature distribution of the substrate W, measured by the thermography 28 and the prestored information at a position corresponding to each compartment of the heating plate 10 and a flat size, feedback control is performed on each division heater so that the average temperature in each region, corresponding to each compartment of the heat plate of the substrate, becomes equal. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008141071(A) 申请公布日期 2008.06.19
申请号 JP20060327513 申请日期 2006.12.04
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HARUMOTO MASAHIKO
分类号 H01L21/027;G05D23/19;H05B3/00;H05B3/68 主分类号 H01L21/027
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