| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent variations in pattern forming positions and pattern sizes from affecting detection precision of defects even if those variations are present. <P>SOLUTION: Local regions are set in an image of a work in which linear circuit patterns are formed in a restricted direction to created a histogram on a concentration gradient direction of edge-constituting pixels in the regions. By analyzing whether the histogram is matched with a histogram of the circuit patterns in the restricted direction, it is determined whether defects are included in the local regions. <P>COPYRIGHT: (C)2008,JPO&INPIT |
