发明名称 METHOD OF PRODUCING COMPOUND OXIDE MEMBRANE, AND HYDROGEN PERMEATION STRUCTURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a compound oxide membrane by which a compound oxide membrane is formed using a high frequency ion plating process, by which a compound oxide membrane with a stable composition can be easily obtained, and to provide a hydrogen permeation structure having stable performance with a compound oxide membrane obtained by the production method as a component. <P>SOLUTION: The method for producing the compound oxide membrane comprises: a heating stage where an evaporation source composed of the solid powder of raw material elements for a compound oxide is heated at a vacuum degree of &le;9.9&times;10<SP>-4</SP>Pa while keeping the solid powder state; a melting stage where the evaporation source is further heated so as to be melted, and the evaporation source is held to be a melted state for &ge;5 min at a vacuum degree of &le;9.9&times;10<SP>-4</SP>Pa; and a film forming stage by a high frequency ion plating process started after the completion of the melting stage. Also disclosed is a hydrogen permeation structure having an oxide proton conductive membrane formed by the production method. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008138255(A) 申请公布日期 2008.06.19
申请号 JP20060325759 申请日期 2006.12.01
申请人 SUMITOMO ELECTRIC IND LTD 发明人 KANDA RYOKO;MIZUNO OSAMU;BOKU TATSUTAMA
分类号 C23C14/32;B01D69/10;B01D71/02;C01B3/56;C01B13/14;C01G25/00;C23C14/08;H01M8/02 主分类号 C23C14/32
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