发明名称 |
METHOD OF PRODUCING COMPOUND OXIDE MEMBRANE, AND HYDROGEN PERMEATION STRUCTURE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a compound oxide membrane by which a compound oxide membrane is formed using a high frequency ion plating process, by which a compound oxide membrane with a stable composition can be easily obtained, and to provide a hydrogen permeation structure having stable performance with a compound oxide membrane obtained by the production method as a component. <P>SOLUTION: The method for producing the compound oxide membrane comprises: a heating stage where an evaporation source composed of the solid powder of raw material elements for a compound oxide is heated at a vacuum degree of ≤9.9×10<SP>-4</SP>Pa while keeping the solid powder state; a melting stage where the evaporation source is further heated so as to be melted, and the evaporation source is held to be a melted state for ≥5 min at a vacuum degree of ≤9.9×10<SP>-4</SP>Pa; and a film forming stage by a high frequency ion plating process started after the completion of the melting stage. Also disclosed is a hydrogen permeation structure having an oxide proton conductive membrane formed by the production method. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008138255(A) |
申请公布日期 |
2008.06.19 |
申请号 |
JP20060325759 |
申请日期 |
2006.12.01 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
KANDA RYOKO;MIZUNO OSAMU;BOKU TATSUTAMA |
分类号 |
C23C14/32;B01D69/10;B01D71/02;C01B3/56;C01B13/14;C01G25/00;C23C14/08;H01M8/02 |
主分类号 |
C23C14/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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