| 发明名称 |
PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION |
| 摘要 |
The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
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| 申请公布号 |
US2008138742(A1) |
申请公布日期 |
2008.06.12 |
| 申请号 |
US20070876945 |
申请日期 |
2007.10.23 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
KODAMA KUNIHIKO;TSUCHIMURA TOMOTAKA;SAEGUSA HIROSHI;TSUBAKI HIDEAKI |
| 分类号 |
G03F7/039;C07C381/12;G03F7/26 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 地址 |
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