发明名称 POSITIONING DEVICE, EXPOSURE SYSTEM, METHOD FOR MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To achieve a reduction in movement stroke of a mass while driving the mass to reduce reactive force that accompanies a movement of a stage. <P>SOLUTION: A positioning device has an inertia imparting mechanism for driving a mass. The inertia imparting mechanism includes: a reactive force compensation control system for generating and outputting a signal for reducing reactive force that accompanies a movement of a stage; a position compensation control system for generating and outputting a signal for reducing the relative distance between a plurality of masses accumulated; and selecting means for selecting and outputting a part of the output of the position compensation control system. The driving of a mass is controlled in accordance with the output of the selecting means. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008134252(A) 申请公布日期 2008.06.12
申请号 JP20070305992 申请日期 2007.11.27
申请人 CANON INC 发明人 ITO HIROHITO;TSUI KOTARO
分类号 G12B5/00;B23Q1/00;B23Q1/30;G03F7/20;G05B19/19;G05D3/00;H01L21/027;H01L21/68 主分类号 G12B5/00
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