发明名称 Method for fabricating an organic thin film transistor by oxidation and selective reduction of organic semiconductor material
摘要 Disclosed is a method for fabricating an organic thin film transistor by oxidation and selective reduction of an organic semiconductor material. According to the method, stability of interfaces between a semiconductor layer and source/drain electrodes of an organic thin film transistor may be guaranteed. Therefore, an organic thin film transistor fabricated by the method may exhibit improved performance characteristics, e.g., minimized or decreased contact resistance and increased charge carrier mobility.
申请公布号 US2008128684(A1) 申请公布日期 2008.06.05
申请号 US20070819036 申请日期 2007.06.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM DO HWAN;HAHN JUNG SEOK;LEE SANG YOON;KOO BON WON
分类号 H01L51/40;H01L51/00 主分类号 H01L51/40
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