发明名称 VACUUM CHAMBER AND ELECTRON BEAM LITHOGRAPHIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent deformation of a base that holds a device in the internal space of a vacuum chamber. SOLUTION: When a force that would deform the base 15 acts due to evacuation of the interior space 10A, 10B of the vacuum chamber 11, the pressure difference between the interior space 10B and an external space is made to act on so as to cancel the deformation of the base 15 via a correction mechanism 50. Consequently, deformation of the vicinity of a central part of the base 15 is prevented, and it becomes possible to properly maintain the flatness of the base 15. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008129358(A) 申请公布日期 2008.06.05
申请号 JP20060314761 申请日期 2006.11.21
申请人 RICOH CO LTD;KURESUTETSUKU:KK 发明人 YOSHIKAWA HIROSHI;MIZUTA OSAMU;MIYAZAKI TAKESHI
分类号 G03F7/20;H01J37/20;H01J37/305;H01L21/027 主分类号 G03F7/20
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