| 摘要 |
<p>An exposing apparatus is provided to improve throughput by using a plurality of stations and a multiplicity of substrate stages to execute plural jobs. An exposing apparatus includes a plurality of stations(1,1') and a multiplicity of substrate stages(2,2') and executes plural jobs using them to expose a substrate with an irradiated energy. A controller(4) acquires the plural jobs to determine an execution order of the plural jobs. One of the substrate stages has a configuration unit different from the other. The controller determines the execution order of the plural jobs based on position data with respect to each of the substrate stages, data of components with respect to the substrate stages, and data of the configuration unit. The controller further determines the execution order of the plural jobs based on data of a combination of the jobs.</p> |
