发明名称 TRANSFER DEVICE AND TRANSFER PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a new transfer device and transfer process which realize nanoimprinting on a larger area with higher throughput. SOLUTION: Transfer plate 33 having predefined fine patterns is pressed against a substrate film F1 previously coated with a resin. The fine patterns are transferred to the resin. The transfer plate 33 is processed into a cylindrical form and removably attached to a rotary shaft 32. The substrate film F1 is continuously fed and brought into contact with the surface of the transfer plate 33 on the rotary shaft 32 to continuously transfer the predetermined fine patterns on the resin. Since the predetermined fine patterns are continuously transferred on the substrate film F1, nanoimprinting on a larger area with higher throughput is easily attained. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008126543(A) 申请公布日期 2008.06.05
申请号 JP20060314749 申请日期 2006.11.21
申请人 ASAHI KASEI CORP 发明人 TANAKA YUJI;ITO KENJI;FUJIWARA KAZUYUKI
分类号 B29C59/04;H01L21/027 主分类号 B29C59/04
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