发明名称 APPARTUS FOR FABRICATING THIN FILM PATTERN AND METHOD FOR FABRICATING USING THE SAME
摘要 <p>An apparatus for fabricating a thin film pattern and a thin film pattern fabricating method using the same are provided to simplify a manufacturing process by forming the thin film pattern using a soft mold and an etch resist. An etch resist coating unit coats an etch resist on a substrate(131) having a thin film(132a). A soft mold(134) includes a protrusion and a groove(134a) and presses the etch resist in order to form an etch resist pattern(133b) having a shape corresponding to the groove. A hardening unit hardens the etch resist. A trapezoid region is formed at an end of the protrusion of the soft mold. The trapezoid region includes a first surface as an end surface of the protrusion, a second surface wider than the first surface, and an inclined surface for connecting the first and second surfaces with each other.</p>
申请公布号 KR20080048713(A) 申请公布日期 2008.06.03
申请号 KR20060119041 申请日期 2006.11.29
申请人 LG DISPLAY CO., LTD. 发明人 NAM, YEON HEUI;KIM, JIN WUK
分类号 H01L21/027 主分类号 H01L21/027
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