发明名称 |
APPARTUS FOR FABRICATING THIN FILM PATTERN AND METHOD FOR FABRICATING USING THE SAME |
摘要 |
<p>An apparatus for fabricating a thin film pattern and a thin film pattern fabricating method using the same are provided to simplify a manufacturing process by forming the thin film pattern using a soft mold and an etch resist. An etch resist coating unit coats an etch resist on a substrate(131) having a thin film(132a). A soft mold(134) includes a protrusion and a groove(134a) and presses the etch resist in order to form an etch resist pattern(133b) having a shape corresponding to the groove. A hardening unit hardens the etch resist. A trapezoid region is formed at an end of the protrusion of the soft mold. The trapezoid region includes a first surface as an end surface of the protrusion, a second surface wider than the first surface, and an inclined surface for connecting the first and second surfaces with each other.</p> |
申请公布号 |
KR20080048713(A) |
申请公布日期 |
2008.06.03 |
申请号 |
KR20060119041 |
申请日期 |
2006.11.29 |
申请人 |
LG DISPLAY CO., LTD. |
发明人 |
NAM, YEON HEUI;KIM, JIN WUK |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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