发明名称 SYSTEM AND METHOD FOR CONTROL OF ELECTROMAGNETIC RADIATION IN PECVD DISCHARGE PROCESSES
摘要 PROBLEM TO BE SOLVED: To provide a system for and a method of coating a substrate with a film. SOLUTION: One embodiment includes a process that provides a substrate on which to deposit a film; generates a plasma to produce radicals from a support gas; disassociates a precursor gas using the radicals; deposits a material from the disassociated precursor gas on the substrate; and controls the amount of electromagnetic radiation to which the deposited material is exposed. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008121115(A) 申请公布日期 2008.05.29
申请号 JP20070286527 申请日期 2007.11.02
申请人 APPLIED MATERIALS INC 发明人 STOWELL MICHAEL W;LIEHR MICHAEL;DIEGUEZ-CAMPO JOSE MANUEL
分类号 C23C16/52;C23C16/50;H01L21/31;H01L21/316 主分类号 C23C16/52
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