发明名称 |
SYSTEM AND METHOD FOR CONTROL OF ELECTROMAGNETIC RADIATION IN PECVD DISCHARGE PROCESSES |
摘要 |
PROBLEM TO BE SOLVED: To provide a system for and a method of coating a substrate with a film. SOLUTION: One embodiment includes a process that provides a substrate on which to deposit a film; generates a plasma to produce radicals from a support gas; disassociates a precursor gas using the radicals; deposits a material from the disassociated precursor gas on the substrate; and controls the amount of electromagnetic radiation to which the deposited material is exposed. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008121115(A) |
申请公布日期 |
2008.05.29 |
申请号 |
JP20070286527 |
申请日期 |
2007.11.02 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
STOWELL MICHAEL W;LIEHR MICHAEL;DIEGUEZ-CAMPO JOSE MANUEL |
分类号 |
C23C16/52;C23C16/50;H01L21/31;H01L21/316 |
主分类号 |
C23C16/52 |
代理机构 |
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地址 |
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