| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum vapor-deposition apparatus which can more effectively improve a throughput of a vapor deposition operation for a substrate. SOLUTION: The vacuum vapor-deposition apparatus 1 comprises: an evaporation section 4, a crucible-exchanging section 5, and a discal turret disc 14 which is rotatably arranged in between the evaporation section 4 and the crucible-exchanging section 5. The turret disc 14 has sets of three crucible-charging holes 16 formed at a predetermined space in a rotating direction. The crucibles each accommodating an evaporation material are charged in these crucible-charging holes 16. The crucible-charging holes 16 of the turret disc 14 can rotate and move in between an evaporation position in the evaporation section 4 and a crucible-exchanging position in the crucible-exchanging section 5. Thereby, when the evaporation material in three crucibles held in the crucible-charging holes 16 are vaporized in the evaporation position, the crucibles in the crucible-charging holes 16 of the opposite side are exchanged in the crucible-exchanging position. COPYRIGHT: (C)2008,JPO&INPIT
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