发明名称 PROJECTION ELECTRONIC MICROSCOPE FOR REDUCING GEOMETRIC ABERRATION AND SPACE CHARGE EFFECT
摘要 A projection electronic microscope is provided for improving geometric aberration and a space charge effect within a zooming range using a zoom type transfer lens system in a projection/image formation optical system. The projection electronic microscope comprises an irradiation system for emitting a primary electron beam irradiated to a sample, and a projection/image formation optical system for guiding a second electron beams emitted from the sample with the irradiation of the primary electron beam to a detection system. The projection/image formation optical system includes a zoom type transfer lens system having a first zoom lens and a second zoom lens. The first zoom lens includes a plurality of electrodes. A predetermined electrode of said plurality of electrodes is made thicker and is applied with a positive voltage to form a space having zero field strength and a high positive potential between said first zoom lens and said second zoom lens, and a cross-over by said first zoom lens is defined in said space within a zooming range.
申请公布号 US2008121820(A1) 申请公布日期 2008.05.29
申请号 US20070944503 申请日期 2007.11.23
申请人 EBARA CORPORATION 发明人 REN WEIMING;MURAKAMI TAKESHI
分类号 H01J37/26;G02B21/00 主分类号 H01J37/26
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