发明名称 THIN FILM TRANSISTOR SUBSTRATE AND METOD OF FABRICATING THE SAME
摘要 A TFT(Thin Film Transistor) substrate and a method for fabricating the same are provided to prevent corrosion of gate ends, prevent a pixel defect, and reduce processing time. A TFT substrate(100) includes gate wiring formed on an insulating substrate(10), including gate lines, gate electrodes(26), and gate ends(24). A gate insulating pattern(32), an active layer pattern(44), and ohmic contact layer patterns(55,56) are sequentially arranged at a part of the gate wiring except the gate ends. Data wiring includes a capping pattern(61) directly contacting with the gate ends for covering the gate ends, data lines(62) crossing the gate lines, and source and drain electrodes(65,66) formed on the ohmic contact layer patterns, separated from each other. Auxiliary gate ends(84) are electrically connected with the gate ends.
申请公布号 KR20080045961(A) 申请公布日期 2008.05.26
申请号 KR20060115287 申请日期 2006.11.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SHIN, DEUK SOO;LEE, JAE HYUNG
分类号 G02F1/136 主分类号 G02F1/136
代理机构 代理人
主权项
地址