| 摘要 |
<p>A method of preventing a semiconductor exposure device from being vibrated is provided to improve the uniformity of a pattern CD due to attenuation vibration of a mass damper for attenuating the vibration of a lens unit. A method of preventing a semiconductor exposure device from being vibrated comprises the following steps of: sensing vibration through a plurality of sensors(301,302,303,304,305) attached to a plurality of vibration positions in a semiconductor exposure device(100); receiving information about the vibration sensed by the plurality of sensors through a control unit(400) and generating control information for attenuating the vibration of a lens unit of the exposure device sensed by a sensor attached to a upper side of the lens unit among the plurality of vibration positions; and receiving the control information and attenuating vibration of the lens unit through a mass damper(200), being spaced apart from the sensor attached to a upper side of the lens unit and mounted on the lens unit.</p> |
