APPARATUS FOR TREATING SUBSTRATES AND METHOD FOR CLEANING AIR IN THE SAME APPARATUS

摘要

A substrate processing device and a method of cleaning air therein are provided to improve the productivity by preventing process defects. A substrate processing device includes a clean room(100), a chemical filter(312), and a blower(314). Plural process units are disposed in the clean room. A grating is formed on a bottom surface of the clean room. Discharge holes are formed in the grating. The chemical filter is disposed on a lower portion of the grating in the clean room. The chemical filter filters chemical pollution material in air discharged through the discharge holes. The blower is disposed between the grating and the chemical filter and increases speed of the discharged air introduced into the chemical filter. A blower protecting net(316) is installed in a upper side of the blower.