发明名称 |
NEAR-FIELD EXPOSURE MASK, NEAR-FIELD EXPOSURE APPARATUS, AND NEAR-FIELD EXPOSURE METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a near-field exposure mask capable of ensuring intimate contact between the mask and an object to be exposed in a large area by a simple mechanism even when waving is present in the object substrate to be exposed, and to provide a near-field exposure apparatus and a near-field exposure method. <P>SOLUTION: The near-field exposure mask includes a light blocking film 102 having an opening 103 smaller than a wavelength of exposure light, and a mask base material 101 holding the light blocking film, and is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material comprises a synthetic resin material transparent to the exposure light and having Young's modulus in a range from 1 GPa to 10 GPa. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008112142(A) |
申请公布日期 |
2008.05.15 |
申请号 |
JP20070208354 |
申请日期 |
2007.08.09 |
申请人 |
CANON INC |
发明人 |
ITO TOSHIKI;YAMAGUCHI TAKAKO;MIZUTANI NATSUHIKO |
分类号 |
G03F1/00;G03F1/60;G03F7/20;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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