| 摘要 |
A fabrication method for a photomask is disclosed. Two or more metal layers (2, 3) are formed over a substrate (1), and a main pattern (5) and a monitor pattern (6) are formed over one or more ones of the two or more metal layers (2, 3) other than the lowermost metal layer (2). Then, the monitor pattern (6) is measured, and the monitor pattern (6) after measured is removed. Then, the main pattern (5) is formed over the lowermost metal layer (2) to fabricate a photomask formed from the two or more metal layers (2, 3). |
