发明名称 DIAMOND SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a diamond substrate suitable for forming diamond film by a thick film vapor phase synthesis by controlling the surface shape of the diamond substrate by a machine polishing. SOLUTION: The diamond substrate is one that has a plurality of protruded parts formed on its surface wherein the protruded parts are formed on the principal surface of the diamond substrate. In the diamond substrate, it is preferred that the area in plan view of the pattern appeared on the top surface of the protruded parts occupies 10% or more against the area of the principal surface of the diamond substrate. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008105872(A) 申请公布日期 2008.05.08
申请号 JP20060288294 申请日期 2006.10.24
申请人 SUMITOMO ELECTRIC IND LTD 发明人 TANIZAKI KEISUKE;SEKI YUICHIRO;MEGURO KIICHI;YAMAMOTO YOSHIYUKI;IMAI TAKAHIRO
分类号 C30B29/04;C23C16/27;C23C16/511 主分类号 C30B29/04
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