PHOTOSENSITIVE RESIN COMPOSITION

摘要

A photosensitive resin composition is provided to realize excellent alkali developability, and to produce a cured resin product useful for forming protrusions for a liquid crystal display having excellent liquid crystal aligning property and voltage maintenance characteristics. An photosensitive resin composition capable of alkali development comprises: (A) a hydrophilic resin containing a (meth)acryloyl group and carboxyl group; (B) polysiloxane; and (C) a photoradical polymerization initiator. The polysiloxane(B) has at least two hydrolyzable alkoxy groups. The hydrophilic resin(A) is obtained by modifying an epoxy resin. The hydrophilic resin and polysiloxane have a difference in solubility parameters of -4.0 to 4.0.