| 摘要 |
<p>A lithographic apparatus is provided to avoid an erroneous position of a pattern projected to a substrate by detecting a slip of a patterning device. An illumination system is structured to condition a radiation beam. A support body is structured to support a patterning device so that a pattern is given to the section of a radiation beam to form a patterned radiation beam. A substrate table is structured to support a substrate. A projection system is structured to project the patterned radiation beam on a target region of the substrate. A support body position sensor(SPS) measures the relative position of the support body with respect to a first structure of a lithographic apparatus. A patterning device position sensor(PDPS) measure the relative position of the patterning device with respect to a second structure of the lithographic apparatus. From a position measured by the support body position sensor, a position measured by the patterning device position sensor and a mutual position of the first and second structures, a control device is structure to determine a mutual relation of the position of the patterning device and the position of the support body. The second structure can include the projection system, the first structure can include a reference structure of the lithographic apparatus, and the projection system can be mounted on the reference structure.</p> |
