| 摘要 |
An apparatus ( 3 ) for removing developing solution from a substrate ( 30 ) includes a working table ( 36 ) for placing the substrate, a supporting frame ( 33 ) positioned on the working table, a gas dispensing nozzle ( 31 ) mounted on the supporting frame, and a water dispensing nozzle ( 32 ) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.
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