| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate mount table capable of reducing the running cost of an apparatus and improving a working ratio. SOLUTION: A lower electrode 12 as a substrate mount table is arranged in a chamber 11 of a plasma treatment apparatus 10; an electrostatic chuck (ESC) 16 is arranged at an upper part in the lower electrode 12; and a 3A-family element oxide film such as a yttria (Y<SB>2</SB>O<SB>3</SB>) film 38 in a periodic table having a film thickness of 1,000-2,000μm is formed on the sidewall of the electrostatic chuck 16 as flame spraying coating. COPYRIGHT: (C)2008,JPO&INPIT
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