| 发明名称 |
Immersion lithography system and method having a wafer chuck made of a porous material |
| 摘要 |
An immersion lithography apparatus having a substrate chuck made of a porous material. The porous substrate chuck is provided to contact and support the back surface of the substrate and hold the substrate in place. The porous substrate chuck facilitates in the removal of any immersion liquid under the substrate.
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| 申请公布号 |
US2008100812(A1) |
申请公布日期 |
2008.05.01 |
| 申请号 |
US20070907218 |
申请日期 |
2007.10.10 |
| 申请人 |
NIKON CORPORATION |
发明人 |
POON ALEX KA TIM;KHO LEONARD WAI FUNG;KESWANI GAURAV;COON DEREK |
| 分类号 |
G03B27/52;G03C5/00 |
主分类号 |
G03B27/52 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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