摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an etching liquid and an etching method suitable for the wet etching of an aluminum-containing material, and to provide a method for producing a counter substrate or the like. <P>SOLUTION: The etching liquid for an aluminum-containing material is composed of a solution containing ammonium hydrogen fluoride, hydrogen peroxide and water. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |