发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 A substrate treating apparatus is provided to measure the state of the treating solution projected from a slit nozzle in a compression sensor, thereby improving the accurate of coating treatment. An air discharge pipe(42) is installed at the secondary side of a slit nozzle(41). The pipe and a pipe(63) installed at the primary side of the slit nozzle are communicated directly and the pipe is communicated with an oil path(410) within the slit nozzle directly. A compression sensor(413) is installed at the pipe and the measured value is transmitted to a control member. The resist solution is supplied to the slit nozzle from a pump(61) and at this time, the compression within the pipe is measured by the compression sensor. The slit nozzle includes the first body member(41a) and the second body member(41b). A predetermined concave portion is installed at the contact surface of the first body member. The contact surfaces of the first and second body member are united with each other, the concave portion of the first body member acts as the oil path of the resist solution.
申请公布号 KR100821063(B1) 申请公布日期 2008.04.08
申请号 KR20070073338 申请日期 2007.07.23
申请人 DAI NIPPON SCREEN MFG. CO., LTD. 发明人 TAKAGI YOSHINORI;OKADA HIROSHI
分类号 G02F1/13 主分类号 G02F1/13
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