| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a diffusion board capable of applying ample light quantity to a light-receiving element even by light with a numerical aperture NA that exceeds "1", a method for manufacturing the diffusion board, an immersion exposure apparatus that uses the diffusion board, and a device manufacturing method that uses the immersion exposure apparatus. <P>SOLUTION: The diffusion board 206, to be used for the immersion exposure apparatus, has a flat surface 206b formed toward a projecting optical system 30 of the immersion exposure apparatus and a diffusion surface 206a, formed on the rear side of the flat surface 206b by repeatedly forming projected portions 206c. and is arranged in an aperture 202 of a case 201 on a wafer stage 45, facing a light-receiving element 207 for receiving an exposure light via the projecting optical system 30. The aspect ratio, obtained by dividing the height of the projected portion 206c by the pitch of the projected portions 206c, is 1 or larger, and is, preferably, in a range of 1.5 to 3. <P>COPYRIGHT: (C)2008,JPO&INPIT |
