| 摘要 |
<p>A resist composition containing: a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of from 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and a compound capable of generating a compound having a structure represented by the following formula (A-I) upon irradiation with actinic rays or radiation:
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ Q 1 -X 1 -NH-X 2 -Q 2 €ƒ€ƒ€ƒ€ƒ€ƒ(A-I)
wherein Q 1 and Q 2 each independently represents a monovalent organic group, provided that either one of Q 1 and Q 2 has a proton acceptor functional group, Q 1 and Q 2 may be combined with each other to form a ring and the ring formed may have a proton acceptor functional group; and X 1 and X 2 each independently represents -CO- or -SO 2 -.</p> |
