| 摘要 |
An apparatus for aligning a source assembly of a PVD chamber is provided to prevent misalignment between a source assembly and a chamber by maintaining the alignment when the source assembly is opened from the chamber. A hinge shaft(110) is hingedly coupled to one side of a source assembly, and an align shaft(120) is vertically fixed to the hinge shaft. Align guides(130,140) are inserted in the align shaft, and are fixed to a PVD(Plasma Vapor Deposition) chamber(11) to align the source assembly together with the align shaft. A support member(150) is secured to the chamber to support the lower end of the align shaft. The lower end of the align shaft is formed in a hemisphere shape, and the support member is provided with a fixing groove(151) corresponding to the hemisphere.
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