RETAINER RING STRUCTURE FOR CHEMICAL-MECHANICAL POLISHING MACHINE AND MANUFACTURING METHOD THEREOF

摘要

A retainer ring structure for a chemical mechanical polishing apparatus and a manufacturing method thereof are provided to continuously keep the flatness by easily and firmly engaging a metal ring and a resin ring. An internal ring made of metal is provided with plural bolt holes(16) engaged to a head of a chemical mechanical polishing apparatus, and plural charging holes(18) formed around the bolt holes and penetrating the internal ring. An external ring(14) made of resin has a space formed in a center portion to enclose the internal ring. Plural penetrating slits(20) are formed on outer portions of the internal ring and the external ring, and penetrate the outer portions. A recycled resin is formed on a predetermined portion in an inner wall of the external ring.