发明名称 DIELECTRIC SPACERS FOR METAL INTERCONNECTS AND METHOD TO FORM THE SAME
摘要 <p>Dielectric spacers for a plurality of metal interconnects and a method to form such dielectric spacers are described. In one embodiment, the dielectric spacers are adjacent to neighboring metal interconnects having flared profiles and are discontiguous from one another. In another embodiment, the dielectric spacers provide a region upon which un-landed vias may effectively land.</p>
申请公布号 WO2008036385(A1) 申请公布日期 2008.03.27
申请号 WO2007US20443 申请日期 2007.09.21
申请人 INTEL CORPORATION;BIELEFELD, JEFFERY, D.;BOYANOV, BOYAN 发明人 BIELEFELD, JEFFERY, D.;BOYANOV, BOYAN
分类号 H01L21/3205;H01L21/28 主分类号 H01L21/3205
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