| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the position measuring accuracy of a lithography device. <P>SOLUTION: A stage system for the lithography equipment is provided. The stage system includes a movable stage and a still motor coil assembly including a coil, and the coil forms a moving magnetic motor for interacting with the magnet of the movable stage and driving the movable stage. The stage system further includes a position measuring system for measuring the position within an operation area of the movable stage, and the position measuring system moves a measuring beam along a measuring beam path extending toward the movable stage at the upper part of a part of the motor coil assembly. The coil assembly includes a coil assembly path between motor coils for driving a motor, and the coil assembly path extends at the lower part of the measuring beam path. The movable stage can include a substrate stage or a reticle stage. <P>COPYRIGHT: (C)2008,JPO&INPIT |
