发明名称 |
PATTERN FORMING METHOD, PATTERN FORMING DEVICE, METHOD FOR MANUFACTURING RECORDING MEDIUM, AND METHOD FOR MANUFACTURING MEMBER |
摘要 |
<P>PROBLEM TO BE SOLVED: To achieve a method of forming a pattern by which a reactive portion of a photosensitive resin is finely controlled upon forming a fine pattern on a substrate and the thickness of the photosensitive resin layer is easily controlled. <P>SOLUTION: The fine pattern is formed by condensing a particularly ultrashort pulse laser beam to focus on an interface between a substrate and a photosensitive resin layer so as to react the photosensitive resin layer. In this process, the ultrashort pulse laser beam is made to irradiate the layer through the substrate side. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008065223(A) |
申请公布日期 |
2008.03.21 |
申请号 |
JP20060245281 |
申请日期 |
2006.09.11 |
申请人 |
FUJITSU LTD |
发明人 |
MATSUSHITA NAOHISA |
分类号 |
G03F7/20;B05D3/06;G11B7/0045;G11B7/09;G11B7/26;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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