发明名称 PATTERN FORMING METHOD, PATTERN FORMING DEVICE, METHOD FOR MANUFACTURING RECORDING MEDIUM, AND METHOD FOR MANUFACTURING MEMBER
摘要 <P>PROBLEM TO BE SOLVED: To achieve a method of forming a pattern by which a reactive portion of a photosensitive resin is finely controlled upon forming a fine pattern on a substrate and the thickness of the photosensitive resin layer is easily controlled. <P>SOLUTION: The fine pattern is formed by condensing a particularly ultrashort pulse laser beam to focus on an interface between a substrate and a photosensitive resin layer so as to react the photosensitive resin layer. In this process, the ultrashort pulse laser beam is made to irradiate the layer through the substrate side. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008065223(A) 申请公布日期 2008.03.21
申请号 JP20060245281 申请日期 2006.09.11
申请人 FUJITSU LTD 发明人 MATSUSHITA NAOHISA
分类号 G03F7/20;B05D3/06;G11B7/0045;G11B7/09;G11B7/26;H01L21/027 主分类号 G03F7/20
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