| 摘要 |
An epitaxial growing method in which a crystal of Al<SUB>x</SUB>Ga<SUB>1-x</SUB>N wherein x is a desirable constituent ratio can be grown on an Si substrate or sapphire substrate according to the HVPE process. Crystal of Al<SUB>x</SUB>Ga<SUB>1-x</SUB>N is grown according to the HVPE process in which use is made of an aluminum material, a gallium material, an ammonia material and a carrier gas. The carrier gas consists of an inert gas and hydrogen, and the partial pressure of hydrogen is set so as to range from 0 to <0.1. As a result, the relationship between feeding ratio among materials and constituent ratio of grown crystal can be made linear, thereby enhancing the controllability of crystal composition.
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