| 摘要 |
A pattern data processing method comprising, obtaining pattern data on a mask pattern, determining whether a processing time for the mask pattern in a processing software is reduced by rotating the mask pattern by a predetermined angle than a case where the mask pattern is processed in the processing software without being rotated, obtaining pattern data on a rotated pattern formed by rotating the mask pattern by the predetermined angle in the case that the processing time is reduced, processing the pattern data on the rotated pattern by using the processing software, and causing the mask pattern to return to its original direction.
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