ONIUM-CONTAINING CMP COMPOSITIONS AND METHODS OF USE THEREOF,申请号WO2007US19570-传众专利搜索

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发明名称	ONIUM-CONTAINING CMP COMPOSITIONS AND METHODS OF USE THEREOF
摘要	The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing semiconductor materials. The composition has a pH of 5 or less and comprises colloidal silica, at least one onium compound selected from the group consisting of a phosphonium salt, a sulfonium salt, and a combination thereof, and an aqueous carrier therefor; A CMP method for polishing a surface of a semiconductor material utilizing the composition is also disclosed.
申请公布号	WO2008030576(A1)	申请公布日期	2008.03.13
申请号	WO2007US19570	申请日期	2007.09.07
申请人	CABOT MICROELECTRONICS CORPORATION	发明人	WHITE, MICHAEL;CHEN, ZHAN
分类号	C09K3/14	主分类号	C09K3/14
代理机构		代理人
主权项
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