<p>The invention aims at providing a polishing pad excellent in planarization characteristics and wear resistance and a process for production of the pad. The invention relates to a polishing pad having a polishing layer made of a micro-cellular polyurethane foam which is characterized in that the polyurethane foam is a cured body formed by reacting (1) an isocyanate -terminated prepolymer (A) capable of reacting with 4,4' -methylenebis(o-chloroaniline) to form a non-cellular polyurethane having a peak temperature of tan d of 100°C or above and (2) an isocyanate-terminated prepolymer (B) capable of reacting with 4,4'-methylenebis(o-chloroaniline) to form a non-cellular polyurethane having a peak temperature of tan d of 40°C or below with (3) 4,4'-methylenebis(o-chloroaniline) at a prepolymer (A)/prepolymer (B) ratio (A/B ratio) of 50/50 to 90/10 (% by weight).</p>
