| 发明名称 |
Silicon carbide polishing method utilizing water-soluble oxidizers |
| 摘要 |
The inventive method comprises chemically-mechanically polishing a substrate comprising at least one layer of silicon carbide with a polishing composition comprising a liquid carrier, an abrasive, and an oxidizing agent.
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| 申请公布号 |
US2008057713(A1) |
申请公布日期 |
2008.03.06 |
| 申请号 |
US20060515546 |
申请日期 |
2006.09.05 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
DESAI MUKESH;MOEGGENBORG KEVIN |
| 分类号 |
H01L21/302;H01L21/461 |
主分类号 |
H01L21/302 |
| 代理机构 |
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