| 摘要 |
<p>An apparatus for processing HMDS(Hexamethyldisilane) and a process method thereof are provided to uniformly attach a photoresist layer to a surface of a wafer by uniformly spraying the HMDS to the entire surface of the wafer through plural nozzles. A case covers the entire exterior. An upper housing(120) has a nozzle unit(121) at a central unit on a lower side thereof and a shutter(140). The upper housing is connected to a supplying channel(125). The supplying channel supplies HMDS into the case. The nozzle unit includes plural nozzles for spraying the HMDS to a wafer. A lower housing(130) corresponds to the upper housing in the case and has a heating plate(131), an exhausting hole(132), and a driving motor. The exhausting hole is prepared to exhaust the HMDS. The driving motor rotates the heating plate. An X-axis guide and a Y-axis guide are formed on the lower side of the upper housing. The nozzle unit moves along the X-axis guide and the Y-axis guide.</p> |
